Intrinsic parameter fluctuations in decananometer mosfets introduced by gate line edge roughness

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Intrinsic Parameter Fluctuations in Decananometer MOSFETs Introduced by Gate Line Edge Roughness

In this paper, we use statistical three-dimensional (3-D) simulations to study the impact of the gate line edge roughness (LER) on the intrinsic parameters fluctuations in deep decananometer (sub 50 nm) gate MOSFETs. The line edge roughness is introduced using a Fourier synthesis technique based on the power spectrum of a Gaussian autocorrelation function. In carefully designed simulation exper...

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ژورنال

عنوان ژورنال: IEEE Transactions on Electron Devices

سال: 2003

ISSN: 0018-9383

DOI: 10.1109/ted.2003.813457